Variable angle spectroscopic ellipsometry of fluorocarbon films from hot filament chemical vapor deposition

Kenneth K.S. Lau, Jeffrey A. Caulfield, Karen K. Gleason

Research output: Contribution to journalConference articlepeer-review

39 Scopus citations

Abstract

Two sets of fluorocarbon films, with varying hydroxide and carboxyl content and varying grain aspect ratio, were produced via hot filament chemical vapor deposition using hexafluoropropylene oxide as the precursor gas. Variable angle spectroscopic ellipsometry of fluorocarbon films was performed to derive film thickness and film optical constants. Increasing the grain aspect ratio decreased the optical dielectric constant.

Original languageEnglish (US)
Pages (from-to)2404-2411
Number of pages8
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number5
DOIs
StatePublished - Sep 2000
Externally publishedYes
Event47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA
Duration: Oct 2 2000Oct 6 2000

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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