Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters

Ryan W. Fillman; Robert R. Krchnavek

doi:10.1116/1.3250258

Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters

Ryan W. Fillman, Robert R. Krchnavek

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for achieving arbitrary, nanoscale features, over large areas without the use of costly step-and-repeat UV lithography tools. One requirement for NIL is to eliminate adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter. Previous work on thick (>100 nm) diamondlike carbon (DLC) layers indicates that fluorinated DLC (F-DLC) provides a durable antiwear, antistick layer. In this work, a process for depositing an ultrathin layer of F-DLC is shown for SiO₂ based imprinters.

Original language	English (US)
Pages (from-to)	2869-2872
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	27
Issue number	6
DOIs	https://doi.org/10.1116/1.3250258
State	Published - 2009

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.3250258

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title = "Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters",

abstract = "Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for achieving arbitrary, nanoscale features, over large areas without the use of costly step-and-repeat UV lithography tools. One requirement for NIL is to eliminate adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter. Previous work on thick (>100 nm) diamondlike carbon (DLC) layers indicates that fluorinated DLC (F-DLC) provides a durable antiwear, antistick layer. In this work, a process for depositing an ultrathin layer of F-DLC is shown for SiO2 based imprinters.",

author = "Fillman, {Ryan W.} and Krchnavek, {Robert R.}",

note = "Funding Information: This work was supported primarily by the Nanoscale Science and Engineering Initiative of the National Science Foundation under NSF Award No. CHE-0641523 and by the New York State Office of Science, Technology, and Academic Research (NYSTAR).",

year = "2009",

doi = "10.1116/1.3250258",

language = "English (US)",

volume = "27",

pages = "2869--2872",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

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T1 - Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters

AU - Fillman, Ryan W.

AU - Krchnavek, Robert R.

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Y1 - 2009

N2 - Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for achieving arbitrary, nanoscale features, over large areas without the use of costly step-and-repeat UV lithography tools. One requirement for NIL is to eliminate adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter. Previous work on thick (>100 nm) diamondlike carbon (DLC) layers indicates that fluorinated DLC (F-DLC) provides a durable antiwear, antistick layer. In this work, a process for depositing an ultrathin layer of F-DLC is shown for SiO2 based imprinters.

AB - Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for achieving arbitrary, nanoscale features, over large areas without the use of costly step-and-repeat UV lithography tools. One requirement for NIL is to eliminate adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter. Previous work on thick (>100 nm) diamondlike carbon (DLC) layers indicates that fluorinated DLC (F-DLC) provides a durable antiwear, antistick layer. In this work, a process for depositing an ultrathin layer of F-DLC is shown for SiO2 based imprinters.

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Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters

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