Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters

Ryan W. Fillman, Robert R. Krchnavek

    Research output: Contribution to journalArticlepeer-review

    6 Scopus citations

    Abstract

    Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for achieving arbitrary, nanoscale features, over large areas without the use of costly step-and-repeat UV lithography tools. One requirement for NIL is to eliminate adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter. Previous work on thick (>100 nm) diamondlike carbon (DLC) layers indicates that fluorinated DLC (F-DLC) provides a durable antiwear, antistick layer. In this work, a process for depositing an ultrathin layer of F-DLC is shown for SiO2 based imprinters.

    Original languageEnglish (US)
    Pages (from-to)2869-2872
    Number of pages4
    JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
    Volume27
    Issue number6
    DOIs
    StatePublished - 2009

    All Science Journal Classification (ASJC) codes

    • Condensed Matter Physics
    • Electrical and Electronic Engineering

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