Toward a universal anti-stick layer for nanoimprint lithography imprinters: Ultra-thin F-DLC

Ryan W. Fillman; John Carroll; Robert R. Krchnavek

doi:10.1109/NMDC.2009.5167565

Toward a universal anti-stick layer for nanoimprint lithography imprinters: Ultra-thin F-DLC

Ryan W. Fillman, John Carroll, Robert R. Krchnavek

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Scopus citations

Abstract

Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for nanoscale features. The elimination of the adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter is crucial for a reliable transfer of the nanoscale pattern. Previous work on thick (>100 nm) diamond-like carbon (DLC) layers indicates fluorinated diamond-like carbon (F-DLC) provides a durable anti-wear, anti-stick layer. In this work, a process for depositing an ultra-thin layer of F-DLC is shown using current imprinter substrates.

Original language	English (US)
Title of host publication	2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
Pages	186-189
Number of pages	4
DOIs	https://doi.org/10.1109/NMDC.2009.5167565
State	Published - 2009
Event	2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009 - Traverse City, MI, United States Duration: Jun 2 2009 → Jun 5 2009

Publication series

Name	2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009

Conference

Conference	2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
Country/Territory	United States
City	Traverse City, MI
Period	6/2/09 → 6/5/09

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials

Access to Document

10.1109/NMDC.2009.5167565

Cite this

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title = "Toward a universal anti-stick layer for nanoimprint lithography imprinters: Ultra-thin F-DLC",

abstract = "Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for nanoscale features. The elimination of the adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter is crucial for a reliable transfer of the nanoscale pattern. Previous work on thick (>100 nm) diamond-like carbon (DLC) layers indicates fluorinated diamond-like carbon (F-DLC) provides a durable anti-wear, anti-stick layer. In this work, a process for depositing an ultra-thin layer of F-DLC is shown using current imprinter substrates.",

author = "Fillman, {Ryan W.} and John Carroll and Krchnavek, {Robert R.}",

year = "2009",

doi = "10.1109/NMDC.2009.5167565",

language = "English (US)",

isbn = "9781424446964",

series = "2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009",

pages = "186--189",

booktitle = "2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009",

note = "2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009 ; Conference date: 02-06-2009 Through 05-06-2009",

}

Fillman, RW, Carroll, J & Krchnavek, RR 2009, Toward a universal anti-stick layer for nanoimprint lithography imprinters: Ultra-thin F-DLC. in 2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009., 5167565, 2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009, pp. 186-189, 2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009, Traverse City, MI, United States, 6/2/09. https://doi.org/10.1109/NMDC.2009.5167565

Toward a universal anti-stick layer for nanoimprint lithography imprinters: Ultra-thin F-DLC. / Fillman, Ryan W.; Carroll, John; Krchnavek, Robert R.
2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009. 2009. p. 186-189 5167565 (2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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N2 - Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for nanoscale features. The elimination of the adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter is crucial for a reliable transfer of the nanoscale pattern. Previous work on thick (>100 nm) diamond-like carbon (DLC) layers indicates fluorinated diamond-like carbon (F-DLC) provides a durable anti-wear, anti-stick layer. In this work, a process for depositing an ultra-thin layer of F-DLC is shown using current imprinter substrates.

AB - Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for nanoscale features. The elimination of the adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter is crucial for a reliable transfer of the nanoscale pattern. Previous work on thick (>100 nm) diamond-like carbon (DLC) layers indicates fluorinated diamond-like carbon (F-DLC) provides a durable anti-wear, anti-stick layer. In this work, a process for depositing an ultra-thin layer of F-DLC is shown using current imprinter substrates.

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BT - 2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009

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Toward a universal anti-stick layer for nanoimprint lithography imprinters: Ultra-thin F-DLC

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