Toward a universal anti-stick layer for nanoimprint lithography imprinters: Ultra-thin F-DLC

Ryan W. Fillman, John Carroll, Robert R. Krchnavek

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for nanoscale features. The elimination of the adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter is crucial for a reliable transfer of the nanoscale pattern. Previous work on thick (>100 nm) diamond-like carbon (DLC) layers indicates fluorinated diamond-like carbon (F-DLC) provides a durable anti-wear, anti-stick layer. In this work, a process for depositing an ultra-thin layer of F-DLC is shown using current imprinter substrates.

Original languageEnglish (US)
Title of host publication2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
Pages186-189
Number of pages4
DOIs
StatePublished - Nov 23 2009
Event2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009 - Traverse City, MI, United States
Duration: Jun 2 2009Jun 5 2009

Publication series

Name2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009

Conference

Conference2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
Country/TerritoryUnited States
CityTraverse City, MI
Period6/2/096/5/09

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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