TY - GEN
T1 - Polymer nanocoatings by initiated Chemical Vapor Deposition (iCVD)
AU - Gleason, Karen K.
AU - Pryce Lewis, Hilton G.
AU - Chan, Kelvin
AU - Lau, Kenneth K.S.
AU - Mao, Yu
PY - 2005
Y1 - 2005
N2 - Initiated chemical vapor deposition (iCVD) is a novel process capable of producing a range of polymeric and multifunctional nanocoatings. The process utilizes hot filaments to drive gas phase chemistry which enables the deposition of true linear polymers rather than the highly crosslinked organic networks often associated with plasma enhanced CVD. Importantly, the object to be coated remains at room temperature, which means that nanothin coatings can be prepared on materials ranging from plastics to metals. The process is also conformal, which means it provides uniform coverage on objects which have small, complex, 3D geometries.
AB - Initiated chemical vapor deposition (iCVD) is a novel process capable of producing a range of polymeric and multifunctional nanocoatings. The process utilizes hot filaments to drive gas phase chemistry which enables the deposition of true linear polymers rather than the highly crosslinked organic networks often associated with plasma enhanced CVD. Importantly, the object to be coated remains at room temperature, which means that nanothin coatings can be prepared on materials ranging from plastics to metals. The process is also conformal, which means it provides uniform coverage on objects which have small, complex, 3D geometries.
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UR - http://www.scopus.com/inward/citedby.url?scp=32144460507&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:32144460507
SN - 0976798514
SN - 9780976798514
T3 - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
SP - 310
EP - 312
BT - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
A2 - Laudon, M.
A2 - Romanowicz, B.
T2 - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005
Y2 - 8 May 2005 through 12 May 2005
ER -