TY - JOUR
T1 - Observation of nearly intrinsic ferromagnetic resonance linewidth in BaFe12O19 films deposited by pulsed laser deposition
AU - Saraf, L. V.
AU - Lofland, S. E.
AU - Von Cresce, Arthur
AU - Monga, A. P.
AU - Bhagat, S. M.
AU - Ramesh, R.
N1 - Funding Information:
Manuscript received October 1, 2000. This work was supported in part by the Office of Naval Research under Grant ONR N000140010079. L. V. Saraf, A. Von Cresce, A. P. Monga, S. M. Bhagat, and R. Ramesh are with the Department of Materials Engineering, University of Maryland, College Park, MD 20742 (e-mail: [email protected]; {sb27; rr136}@umail.umd.edu). S. E. Lofland is with the Department of Chemistry and Physics, Rowan University, Glassboro, NJ 08028. He is also with the Department of Physics, University of Maryland, College Park, MD 20742 (e-mail: [email protected]). Publisher Item Identifier S 0018-9464(01)06749-8.
PY - 2001/7
Y1 - 2001/7
N2 - We report magnetic resonance results on (0.3-8 μm) films of c-axis oriented barium ferrite grown by pulsed laser deposition on sapphire substrates. By optimizing the growth and annealing parameters, we have observed numerous (up to 25) spin wave resonance modes as well as nearly intrinsic ferromagnetic resonance linewidth of 23 Oe at 58 GHz, when the applied field is parallel to the c axis. On rotation of the field away from the film normal, the linewidth increases rapidly. This is taken in to account by using a small (0.3°) spread in the film orientation combined with the conventional formula for shape anisotropy. Atomic force microscopy surface roughness measurements support these considerations.
AB - We report magnetic resonance results on (0.3-8 μm) films of c-axis oriented barium ferrite grown by pulsed laser deposition on sapphire substrates. By optimizing the growth and annealing parameters, we have observed numerous (up to 25) spin wave resonance modes as well as nearly intrinsic ferromagnetic resonance linewidth of 23 Oe at 58 GHz, when the applied field is parallel to the c axis. On rotation of the field away from the film normal, the linewidth increases rapidly. This is taken in to account by using a small (0.3°) spread in the film orientation combined with the conventional formula for shape anisotropy. Atomic force microscopy surface roughness measurements support these considerations.
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U2 - 10.1109/20.951177
DO - 10.1109/20.951177
M3 - Conference article
AN - SCOPUS:0035385991
SN - 0018-9464
VL - 37
SP - 2377
EP - 2379
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
IS - 4 I
T2 - 8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag)
Y2 - 7 January 2001 through 11 January 2001
ER -