Molecular design of fluorocarbon film architecture by pulsed plasma enhanced and pyrolytic chemical vapor deposition

Scott J. Limb, Kenneth K.S. Lau, David J. Edell, Edward F. Gleason, Karen K. Gleason

Research output: Contribution to journalArticlepeer-review

87 Scopus citations

Abstract

Pulsed plasma enhanced chemical vapor deposition (pulsed PECVD) and pyrolytic chemical vapor deposition (pyrolyric CVD) of fluorocarbon films from hexafluoropropylene oxide (HFPO) have demonstrated the ability to molecularly design film architecture. Film structures ranging from highly amorphous crosslinked matrices to linear perfluoroalkyl chain crystallites can be established by reducing the modulation frequency of plasma discharge in plasma activated deposition and by eventually shifting mechanistically from an electrically activated to a thermally activated process. X-ray photoelectron spectroscopy (XPS) showed CF2 content increasing from 39-65 mol%. Fourier transform infrared spectroscopy (FTIR) showed an increasing resolution between the symmetric and asymmetric CF2 stretches, and a reduction in the intensity of the amorphous PTFE and CF3 bands. High-resolution solid-state 19F nuclear magnetic resonance spectroscopy (NMR) revealed an increasing CF2CF2CF2 character, with the pyrolytic CVD film much like bulk poly(tetrafluoroethylene) (PTFE). X-ray diffraction (XRD) patterns evidenced an increase in crystallinity, with the pyrolytic CVD film showing a characteristic peak at 2θ = 18° representing the (100) plane of the hexagonal structure of crystalline PTFE above 19 °C.

Original languageEnglish (US)
Pages (from-to)21-32
Number of pages12
JournalPlasmas and Polymers
Volume4
Issue number1
DOIs
StatePublished - 1999
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemical Engineering (miscellaneous)
  • General Physics and Astronomy
  • Polymers and Plastics

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