Low dielectric constant fluorocarbon films

K. K.S. Lau, K. K. Gleason

Research output: Contribution to journalConference articlepeer-review

15 Scopus citations

Abstract

A summary is given on the study of fluorocarbon films from chemical vapor deposition (CVD) chemistries. The two CVD paths of interest, pulsed PE/CVD and pyrolytic CVD, are discussed. Structural interpretation of deposited films is made from solid-state nuclear magnetic resonance (NMR) spectroscopy.

Original languageEnglish (US)
Pages (from-to)209-220
Number of pages12
JournalMaterials Research Society Symposium - Proceedings
Volume544
StatePublished - 1999
Externally publishedYes
EventProceedings of the 1998 MRS Fall Meeting - Symposium on Plasma Deposition and Treatment of Polymers - Boston, MA, USA
Duration: Nov 30 1998Dec 2 1998

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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