Abstract
We report, for the first time, the laser direct writing of high-conductivity aluminum interconnects from dimethylaluminum hydride (DMAlH). These lines were deposited from this metalorganic gas using a focused deep-ultraviolet laser beam, and the deposition process was studied as a function of several process parameters. Electrical measurements and Auger electron spectroscopy were used to characterize the quality of the laser-deposited films.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1865-1867 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 52 |
| Issue number | 22 |
| DOIs | |
| State | Published - 1988 |
| Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)
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