Laser direct writing of aluminum conductors

T. Cacouris; G. Scelsi; P. Shaw; R. Scarmozzino; R. M. Osgood; R. R. Krchnavek

doi:10.1063/1.99609

Laser direct writing of aluminum conductors

T. Cacouris, G. Scelsi, P. Shaw, R. Scarmozzino, R. M. Osgood, R. R. Krchnavek

Research output: Contribution to journal › Article › peer-review

54 Scopus citations

Abstract

We report, for the first time, the laser direct writing of high-conductivity aluminum interconnects from dimethylaluminum hydride (DMAlH). These lines were deposited from this metalorganic gas using a focused deep-ultraviolet laser beam, and the deposition process was studied as a function of several process parameters. Electrical measurements and Auger electron spectroscopy were used to characterize the quality of the laser-deposited films.

Original language	English (US)
Pages (from-to)	1865-1867
Number of pages	3
Journal	Applied Physics Letters
Volume	52
Issue number	22
DOIs	https://doi.org/10.1063/1.99609
State	Published - 1988
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.99609

Cite this

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title = "Laser direct writing of aluminum conductors",

abstract = "We report, for the first time, the laser direct writing of high-conductivity aluminum interconnects from dimethylaluminum hydride (DMAlH). These lines were deposited from this metalorganic gas using a focused deep-ultraviolet laser beam, and the deposition process was studied as a function of several process parameters. Electrical measurements and Auger electron spectroscopy were used to characterize the quality of the laser-deposited films.",

author = "T. Cacouris and G. Scelsi and P. Shaw and R. Scarmozzino and Osgood, {R. M.} and Krchnavek, {R. R.}",

year = "1988",

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T1 - Laser direct writing of aluminum conductors

AU - Cacouris, T.

AU - Scelsi, G.

AU - Shaw, P.

AU - Scarmozzino, R.

AU - Osgood, R. M.

AU - Krchnavek, R. R.

PY - 1988

Y1 - 1988

N2 - We report, for the first time, the laser direct writing of high-conductivity aluminum interconnects from dimethylaluminum hydride (DMAlH). These lines were deposited from this metalorganic gas using a focused deep-ultraviolet laser beam, and the deposition process was studied as a function of several process parameters. Electrical measurements and Auger electron spectroscopy were used to characterize the quality of the laser-deposited films.

AB - We report, for the first time, the laser direct writing of high-conductivity aluminum interconnects from dimethylaluminum hydride (DMAlH). These lines were deposited from this metalorganic gas using a focused deep-ultraviolet laser beam, and the deposition process was studied as a function of several process parameters. Electrical measurements and Auger electron spectroscopy were used to characterize the quality of the laser-deposited films.

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ER -

Laser direct writing of aluminum conductors

Abstract

All Science Journal Classification (ASJC) codes

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