TY - GEN
T1 - LASER ASSISTED CVD PROCESS FOR VLSI MICROFABRICATION.
AU - Osgood, R. M.
AU - Gilgen, H. H.
AU - Krchnavek, R.
PY - 1984
Y1 - 1984
N2 - The technology and potential roles of laser direct writing in the processing of advanced integrated electronics are reviewed. Laser direct writing uses light-enhanced chemical reactions to dope, etch, or deposit electronic materials. Laser writing has been used, for example, to repair photolithographic masks and to connect and disconnect devices on integrated circuits.
AB - The technology and potential roles of laser direct writing in the processing of advanced integrated electronics are reviewed. Laser direct writing uses light-enhanced chemical reactions to dope, etch, or deposit electronic materials. Laser writing has been used, for example, to repair photolithographic masks and to connect and disconnect devices on integrated circuits.
UR - http://www.scopus.com/inward/record.url?scp=0021602812&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0021602812&partnerID=8YFLogxK
U2 - 10.7567/ssdm.1984.a-9-1
DO - 10.7567/ssdm.1984.a-9-1
M3 - Conference contribution
AN - SCOPUS:0021602812
SN - 4930813077
SN - 9784930813077
T3 - Conference on Solid State Devices and Materials
SP - 427
EP - 428
BT - Conference on Solid State Devices and Materials
PB - Business Cent for Academic Soc Japan
ER -