LASER ASSISTED CVD PROCESS FOR VLSI MICROFABRICATION.

R. M. Osgood, H. H. Gilgen, R. Krchnavek

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The technology and potential roles of laser direct writing in the processing of advanced integrated electronics are reviewed. Laser direct writing uses light-enhanced chemical reactions to dope, etch, or deposit electronic materials. Laser writing has been used, for example, to repair photolithographic masks and to connect and disconnect devices on integrated circuits.

Original languageEnglish (US)
Title of host publicationConference on Solid State Devices and Materials
PublisherBusiness Cent for Academic Soc Japan
Pages427-428
Number of pages2
ISBN (Print)4930813077
Publication statusPublished - Dec 1 1984

Publication series

NameConference on Solid State Devices and Materials

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All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Osgood, R. M., Gilgen, H. H., & Krchnavek, R. (1984). LASER ASSISTED CVD PROCESS FOR VLSI MICROFABRICATION. In Conference on Solid State Devices and Materials (pp. 427-428). (Conference on Solid State Devices and Materials). Business Cent for Academic Soc Japan.