Kinetic analysis of the initiated chemical vapor deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine)

Sruthi Janakiraman; Steven L. Farrell; Chia Yun Hsieh; Yuriy Y. Smolin; Masoud Soroush; Kenneth K.S. Lau

doi:10.1016/j.tsf.2015.04.083

Kinetic analysis of the initiated chemical vapor deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine)

Sruthi Janakiraman, Steven L. Farrell, Chia Yun Hsieh, Yuriy Y. Smolin, Masoud Soroush, Kenneth K.S. Lau

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

Abstract

Initiated chemical vapor deposition (iCVD) is used to deposit poly(vinylpyrrolidone) (PVP) and poly(4-vinylpyridine) (P4VP). Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and gel permeation chromatography were used to confirm the deposition of the polymers. Reactor conditions, including gas pressure and substrate temperature, were varied to determine the effect on the deposition rate of the polymer. The rate of reaction was found to increase with increasing pressure and decrease with increasing substrate temperature. Understanding the kinetics of the reaction provides a basis for applications of PVP and P4VP thin films in dye sensitized solar cells and other alternative energy applications.

Original language	English (US)
Pages (from-to)	244-250
Number of pages	7
Journal	Thin Solid Films
Volume	595
DOIs	https://doi.org/10.1016/j.tsf.2015.04.083
State	Published - Nov 30 2015
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Kinetic analysis of the initiated chemical vapor deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine)",

abstract = "Initiated chemical vapor deposition (iCVD) is used to deposit poly(vinylpyrrolidone) (PVP) and poly(4-vinylpyridine) (P4VP). Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and gel permeation chromatography were used to confirm the deposition of the polymers. Reactor conditions, including gas pressure and substrate temperature, were varied to determine the effect on the deposition rate of the polymer. The rate of reaction was found to increase with increasing pressure and decrease with increasing substrate temperature. Understanding the kinetics of the reaction provides a basis for applications of PVP and P4VP thin films in dye sensitized solar cells and other alternative energy applications.",

author = "Sruthi Janakiraman and Farrell, {Steven L.} and Hsieh, {Chia Yun} and Smolin, {Yuriy Y.} and Masoud Soroush and Lau, {Kenneth K.S.}",

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doi = "10.1016/j.tsf.2015.04.083",

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T1 - Kinetic analysis of the initiated chemical vapor deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine)

AU - Janakiraman, Sruthi

AU - Farrell, Steven L.

AU - Hsieh, Chia Yun

AU - Smolin, Yuriy Y.

AU - Soroush, Masoud

AU - Lau, Kenneth K.S.

PY - 2015/11/30

Y1 - 2015/11/30

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AB - Initiated chemical vapor deposition (iCVD) is used to deposit poly(vinylpyrrolidone) (PVP) and poly(4-vinylpyridine) (P4VP). Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and gel permeation chromatography were used to confirm the deposition of the polymers. Reactor conditions, including gas pressure and substrate temperature, were varied to determine the effect on the deposition rate of the polymer. The rate of reaction was found to increase with increasing pressure and decrease with increasing substrate temperature. Understanding the kinetics of the reaction provides a basis for applications of PVP and P4VP thin films in dye sensitized solar cells and other alternative energy applications.

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JO - Thin Solid Films

JF - Thin Solid Films

ER -

Kinetic analysis of the initiated chemical vapor deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine)

Abstract

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