Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings

Tyler P. Martin, Kenneth K.S. Lau, Kelvin Chan, Yu Mao, Malancha Gupta, W. Shannan O'Shaughnessy, Karen K. Gleason

Research output: Contribution to journalArticlepeer-review

62 Scopus citations

Abstract

Initiated chemical vapor deposition of polymers (iCVD) is a process similar to hot-wire CVD (HWCVD) in which a free-radical initiating species is employed to greatly increase the growth rate while decreasing the required energy input. In general, iCVD allows for the deposition of linear polymer, copolymer and/or crosslinked films with a wide range of functions. Surveyed examples include antimicrobial, superhydrophobic, superhydrophilic, and other functional thin polymer films and coatings.

Original languageEnglish (US)
Pages (from-to)9400-9405
Number of pages6
JournalSurface and Coatings Technology
Volume201
Issue number22-23 SPEC. ISS.
DOIs
StatePublished - Sep 25 2007
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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