@article{5035bdc5e71c4c68b5d251bf45cf53aa,
title = "Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings",
abstract = "Initiated chemical vapor deposition of polymers (iCVD) is a process similar to hot-wire CVD (HWCVD) in which a free-radical initiating species is employed to greatly increase the growth rate while decreasing the required energy input. In general, iCVD allows for the deposition of linear polymer, copolymer and/or crosslinked films with a wide range of functions. Surveyed examples include antimicrobial, superhydrophobic, superhydrophilic, and other functional thin polymer films and coatings.",
author = "Martin, {Tyler P.} and Lau, {Kenneth K.S.} and Kelvin Chan and Yu Mao and Malancha Gupta and {Shannan O'Shaughnessy}, W. and Gleason, {Karen K.}",
note = "Funding Information: This research was supported in part by, the US Army through the Institute for Soldier Nanotechnologies, under Contract DAAD-19-02-0002 with the US Army Research Office. The authors acknowledge the support of both the NIH, under funding Contract No. NO1-NS2-2347, and the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing. This work in part made use of MRSEC Shared facilities at MIT supported by the National Science Foundation under Award Number MR-400334. We thank the DuPont MIT Alliance for financial support. The authors acknowledge the support of the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing.",
year = "2007",
month = sep,
day = "25",
doi = "10.1016/j.surfcoat.2007.05.003",
language = "English (US)",
volume = "201",
pages = "9400--9405",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "22-23 SPEC. ISS.",
}