Initiated chemical vapor deposition (iCVD) of copolymer thin films

Kenneth K.S. Lau, Karen K. Gleason

Research output: Contribution to journalArticlepeer-review

27 Scopus citations


Initiated chemical vapor deposition (iCVD) represents a novel hot-wire CVD variant for producing copolymer thin films. iCVD copolymerization was characterized by a conventional liquid-phase free radical copolymerization equation when applied to methacrylic acid copolymers. FTIR peak shifts with changing comonomer ratios in the copolymers further supported a copolymerization mechanism. Crosslinked methacrylic acid copolymers provided pH-dependent swelling behavior that enabled an enteric release of active core material when the copolymer was used as an encapsulation coating.

Original languageEnglish (US)
Pages (from-to)678-680
Number of pages3
JournalThin Solid Films
Issue number5
StatePublished - Jan 15 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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