Initiated chemical vapor deposition (iCVD) of copolymer thin films

Kenneth K.S. Lau; Karen K. Gleason

doi:10.1016/j.tsf.2007.06.046

Initiated chemical vapor deposition (iCVD) of copolymer thin films

Kenneth K.S. Lau, Karen K. Gleason

Research output: Contribution to journal › Article › peer-review

28 Scopus citations

Abstract

Initiated chemical vapor deposition (iCVD) represents a novel hot-wire CVD variant for producing copolymer thin films. iCVD copolymerization was characterized by a conventional liquid-phase free radical copolymerization equation when applied to methacrylic acid copolymers. FTIR peak shifts with changing comonomer ratios in the copolymers further supported a copolymerization mechanism. Crosslinked methacrylic acid copolymers provided pH-dependent swelling behavior that enabled an enteric release of active core material when the copolymer was used as an encapsulation coating.

Original language	English (US)
Pages (from-to)	678-680
Number of pages	3
Journal	Thin Solid Films
Volume	516
Issue number	5
DOIs	https://doi.org/10.1016/j.tsf.2007.06.046
State	Published - Jan 15 2008
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2007.06.046

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abstract = "Initiated chemical vapor deposition (iCVD) represents a novel hot-wire CVD variant for producing copolymer thin films. iCVD copolymerization was characterized by a conventional liquid-phase free radical copolymerization equation when applied to methacrylic acid copolymers. FTIR peak shifts with changing comonomer ratios in the copolymers further supported a copolymerization mechanism. Crosslinked methacrylic acid copolymers provided pH-dependent swelling behavior that enabled an enteric release of active core material when the copolymer was used as an encapsulation coating.",

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AU - Gleason, Karen K.

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AB - Initiated chemical vapor deposition (iCVD) represents a novel hot-wire CVD variant for producing copolymer thin films. iCVD copolymerization was characterized by a conventional liquid-phase free radical copolymerization equation when applied to methacrylic acid copolymers. FTIR peak shifts with changing comonomer ratios in the copolymers further supported a copolymerization mechanism. Crosslinked methacrylic acid copolymers provided pH-dependent swelling behavior that enabled an enteric release of active core material when the copolymer was used as an encapsulation coating.

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Initiated chemical vapor deposition (iCVD) of copolymer thin films

Abstract

All Science Journal Classification (ASJC) codes

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