Improved performance of co-sputtered Ni-Ti oxide films for all-solid-state electrochromic devices

Dongmei Dong; Wenwen Wang; Guobo Dong; Fan Zhang; Hang Yu; Yingchun He; Xungang Diao

doi:10.1039/C6RA21961F

Improved performance of co-sputtered Ni-Ti oxide films for all-solid-state electrochromic devices

Dongmei Dong, Wenwen Wang, Guobo Dong, Fan Zhang, Hang Yu, Yingchun He, Xungang Diao

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Thin films of Ni-Ti oxide were co-sputtered by reactive direct current magnetron sputtering and their structures, morphologies, and compositions were investigated by X-ray diffraction, atomic force microscopy and X-ray photo-electron spectroscopy. Their electrochromic (EC) performances were studied using cyclic voltammetry, alternating current impedance and optical transmittance measurements. The proper addition of Ti helps the films achieve excellent EC behavior, including the stable coloration-bleaching cycles, high optical transmittance modulation (∼78%), great coloration efficiency (96 cm² C^-1) and low alternating current impedance. Finally, the multiple-layer stacks ITO/NiO_x:Ti/PVB(Li⁺)/WO₃/ITO were laminated based on the optimization of NiO_x:Ti single layers. A large optical contrast (∼60%), a fast response time (3.2 and 4.4 s) and a good durability were obtained for the all-solid-state full EC device.

Original language	English (US)
Pages (from-to)	111148-111160
Number of pages	13
Journal	RSC Advances
Volume	6
Issue number	112
DOIs	https://doi.org/10.1039/C6RA21961F
State	Published - 2016
Externally published	Yes

All Science Journal Classification (ASJC) codes

General Chemistry
General Chemical Engineering

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title = "Improved performance of co-sputtered Ni-Ti oxide films for all-solid-state electrochromic devices",

abstract = "Thin films of Ni-Ti oxide were co-sputtered by reactive direct current magnetron sputtering and their structures, morphologies, and compositions were investigated by X-ray diffraction, atomic force microscopy and X-ray photo-electron spectroscopy. Their electrochromic (EC) performances were studied using cyclic voltammetry, alternating current impedance and optical transmittance measurements. The proper addition of Ti helps the films achieve excellent EC behavior, including the stable coloration-bleaching cycles, high optical transmittance modulation (∼78%), great coloration efficiency (96 cm2 C-1) and low alternating current impedance. Finally, the multiple-layer stacks ITO/NiOx:Ti/PVB(Li+)/WO3/ITO were laminated based on the optimization of NiOx:Ti single layers. A large optical contrast (∼60%), a fast response time (3.2 and 4.4 s) and a good durability were obtained for the all-solid-state full EC device.",

author = "Dongmei Dong and Wenwen Wang and Guobo Dong and Fan Zhang and Hang Yu and Yingchun He and Xungang Diao",

note = "Publisher Copyright: {\textcopyright} The Royal Society of Chemistry.",

year = "2016",

doi = "10.1039/C6RA21961F",

language = "English (US)",

volume = "6",

pages = "111148--111160",

journal = "RSC Advances",

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T1 - Improved performance of co-sputtered Ni-Ti oxide films for all-solid-state electrochromic devices

AU - Dong, Dongmei

AU - Wang, Wenwen

AU - Dong, Guobo

AU - Zhang, Fan

AU - Yu, Hang

AU - He, Yingchun

AU - Diao, Xungang

N1 - Publisher Copyright: © The Royal Society of Chemistry.

PY - 2016

Y1 - 2016

N2 - Thin films of Ni-Ti oxide were co-sputtered by reactive direct current magnetron sputtering and their structures, morphologies, and compositions were investigated by X-ray diffraction, atomic force microscopy and X-ray photo-electron spectroscopy. Their electrochromic (EC) performances were studied using cyclic voltammetry, alternating current impedance and optical transmittance measurements. The proper addition of Ti helps the films achieve excellent EC behavior, including the stable coloration-bleaching cycles, high optical transmittance modulation (∼78%), great coloration efficiency (96 cm2 C-1) and low alternating current impedance. Finally, the multiple-layer stacks ITO/NiOx:Ti/PVB(Li+)/WO3/ITO were laminated based on the optimization of NiOx:Ti single layers. A large optical contrast (∼60%), a fast response time (3.2 and 4.4 s) and a good durability were obtained for the all-solid-state full EC device.

AB - Thin films of Ni-Ti oxide were co-sputtered by reactive direct current magnetron sputtering and their structures, morphologies, and compositions were investigated by X-ray diffraction, atomic force microscopy and X-ray photo-electron spectroscopy. Their electrochromic (EC) performances were studied using cyclic voltammetry, alternating current impedance and optical transmittance measurements. The proper addition of Ti helps the films achieve excellent EC behavior, including the stable coloration-bleaching cycles, high optical transmittance modulation (∼78%), great coloration efficiency (96 cm2 C-1) and low alternating current impedance. Finally, the multiple-layer stacks ITO/NiOx:Ti/PVB(Li+)/WO3/ITO were laminated based on the optimization of NiOx:Ti single layers. A large optical contrast (∼60%), a fast response time (3.2 and 4.4 s) and a good durability were obtained for the all-solid-state full EC device.

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DO - 10.1039/C6RA21961F

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EP - 111160

JO - RSC Advances

JF - RSC Advances

IS - 112

ER -

Improved performance of co-sputtered Ni-Ti oxide films for all-solid-state electrochromic devices

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