Growth of colossal magnetoresistance thin films on silicon

Z. Trajanovic; C. Kwon; M. C. Robson; K. C. Kim; M. Rajeswari; R. Ramesh; T. Venkatesan; S. E. Lofland; S. M. Bhagat; D. Fork

doi:10.1063/1.117967

Growth of colossal magnetoresistance thin films on silicon

Z. Trajanovic, C. Kwon, M. C. Robson, K. C. Kim, M. Rajeswari, R. Ramesh, T. Venkatesan, S. E. Lofland, S. M. Bhagat, D. Fork

Research output: Contribution to journal › Article › peer-review

106 Scopus citations

Abstract

We are able to grow high quality La_0.67Sr_0.33MnO₃(LSMO) colossal magnetoresistive (CMR) thin films on Y-stabilized zirconia (YSZ) buffered (100) Si substrates using a Bi₄Ti₃O₁₂ texturing and lattice matching layer. The CMR films have very high structural perfection and show excellent transport and ferromagnetic properties, including the almost full saturation magnetization values and narrow ferromagnetic resonance peaks (15 Oe at 290 K). The lattice matching template/buffer layer approach is suitable for the high quality CMR films on Si. A close correlation between the magnetic hysteresis loop and the field dependence of MR is observed at lower temperatures.

Original language	English (US)
Pages (from-to)	1005-1007
Number of pages	3
Journal	Applied Physics Letters
Volume	69
Issue number	7
DOIs	https://doi.org/10.1063/1.117967
State	Published - Aug 12 1996
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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title = "Growth of colossal magnetoresistance thin films on silicon",

abstract = "We are able to grow high quality La0.67Sr0.33MnO3(LSMO) colossal magnetoresistive (CMR) thin films on Y-stabilized zirconia (YSZ) buffered (100) Si substrates using a Bi4Ti3O12 texturing and lattice matching layer. The CMR films have very high structural perfection and show excellent transport and ferromagnetic properties, including the almost full saturation magnetization values and narrow ferromagnetic resonance peaks (15 Oe at 290 K). The lattice matching template/buffer layer approach is suitable for the high quality CMR films on Si. A close correlation between the magnetic hysteresis loop and the field dependence of MR is observed at lower temperatures.",

author = "Z. Trajanovic and C. Kwon and Robson, {M. C.} and Kim, {K. C.} and M. Rajeswari and R. Ramesh and T. Venkatesan and Lofland, {S. E.} and Bhagat, {S. M.} and D. Fork",

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doi = "10.1063/1.117967",

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TY - JOUR

T1 - Growth of colossal magnetoresistance thin films on silicon

AU - Trajanovic, Z.

AU - Kwon, C.

AU - Robson, M. C.

AU - Kim, K. C.

AU - Rajeswari, M.

AU - Ramesh, R.

AU - Venkatesan, T.

AU - Lofland, S. E.

AU - Bhagat, S. M.

AU - Fork, D.

PY - 1996/8/12

Y1 - 1996/8/12

N2 - We are able to grow high quality La0.67Sr0.33MnO3(LSMO) colossal magnetoresistive (CMR) thin films on Y-stabilized zirconia (YSZ) buffered (100) Si substrates using a Bi4Ti3O12 texturing and lattice matching layer. The CMR films have very high structural perfection and show excellent transport and ferromagnetic properties, including the almost full saturation magnetization values and narrow ferromagnetic resonance peaks (15 Oe at 290 K). The lattice matching template/buffer layer approach is suitable for the high quality CMR films on Si. A close correlation between the magnetic hysteresis loop and the field dependence of MR is observed at lower temperatures.

AB - We are able to grow high quality La0.67Sr0.33MnO3(LSMO) colossal magnetoresistive (CMR) thin films on Y-stabilized zirconia (YSZ) buffered (100) Si substrates using a Bi4Ti3O12 texturing and lattice matching layer. The CMR films have very high structural perfection and show excellent transport and ferromagnetic properties, including the almost full saturation magnetization values and narrow ferromagnetic resonance peaks (15 Oe at 290 K). The lattice matching template/buffer layer approach is suitable for the high quality CMR films on Si. A close correlation between the magnetic hysteresis loop and the field dependence of MR is observed at lower temperatures.

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JO - Applied Physics Letters

JF - Applied Physics Letters

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Growth of colossal magnetoresistance thin films on silicon

Abstract

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