Linda Head, Sunny A. Padacheril, Yun Leei Chiou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations


The effects of annealing on thick-film resistor noise characteristics were studied experimentally. The annealing process was performed on as-fired, laser trimmed and air-abrasive trimmed resistors. Noise Index measurements showed annealing to be an effective means of reducing resistor noise. Using a temperature range of 200 degree C to 570 degree C, different annealing sequences were performed. They produced NI reductions that depended upon the exact temperature level and resistor state (i. e. , as-fired or trimmed). An analytical investigation of the equation which describes thick-film resistor noise is performed to describe the results of the annealing process graphically. Plots of NI vs. log V show a change in NI constant relating to the resistor material properties and a slight modification of the slope.

Original languageEnglish (US)
Title of host publicationUnknown Host Publication Title
PublisherInt Soc for Hybrid Microelectronics
Number of pages5
ISBN (Print)0930815130
StatePublished - Dec 1 1985
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)


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