The effects of annealing on thick-film resistor noise characteristics were studied experimentally. The annealing process was performed on as-fired, laser trimmed and air-abrasive trimmed resistors. Noise Index measurements showed annealing to be an effective means of reducing resistor noise. Using a temperature range of 200 degree C to 570 degree C, different annealing sequences were performed. They produced NI reductions that depended upon the exact temperature level and resistor state (i. e. , as-fired or trimmed). An analytical investigation of the equation which describes thick-film resistor noise is performed to describe the results of the annealing process graphically. Plots of NI vs. log V show a change in NI constant relating to the resistor material properties and a slight modification of the slope.
|Original language||English (US)|
|Title of host publication||Unknown Host Publication Title|
|Publisher||Int Soc for Hybrid Microelectronics|
|Number of pages||5|
|State||Published - Dec 1 1985|
All Science Journal Classification (ASJC) codes