Degradation of PFOA with a nanosecond-pulsed plasma gas–liquid flowing film reactor

Radha K.M. Bulusu, Robert J. Wandell, Zhiming Zhang, Meysam Farahani, Youneng Tang, Bruce R. Locke

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

A continuous gas–liquid flowing film reactor with a nanosecond-pulsed power supply was utilized for the degradation of perfluorooctanoic acid (PFOA) as assessed by fluoride (F) formation. PFOA, 50 mg/L, dissolved in deionized water was supplied at 2 ml/min with an argon carrier gas. The liquid phase was analyzed for F using ion chromatography. The power supply pulse frequency (f) was varied between 0.25- and 10-kHz using a constant 16-kV input voltage and 40-ns pulse width. The highest F production rate ((Formula presented.)), 1.57 × 10−8 mol/s, occurred at 5 kHz whereas the highest efficiency of F production ((Formula presented.)), 9.12 × 10−9 mol/J, was found at 0.25 kHz.

Original languageEnglish (US)
Article number2000074
JournalPlasma Processes and Polymers
Volume17
Issue number8
DOIs
StatePublished - Aug 1 2020
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Polymers and Plastics

Fingerprint

Dive into the research topics of 'Degradation of PFOA with a nanosecond-pulsed plasma gas–liquid flowing film reactor'. Together they form a unique fingerprint.

Cite this