Deep-censoring method for early reliability assessment

Harry A. Schafft, Linda Head, James A. Lechner, Jason Gill, Timothy D. Sullivan

Research output: Contribution to conferencePaperpeer-review

3 Scopus citations

Abstract

Deep censoring is proposed as a direct method to assess the early reliability of semiconductor products. The method characterizes, in particular, the early part of the failure-time distribution and is described in the context of interconnect reliability and electromigration. In this context, it involves stressing a large number of test lines only long enough for some small number of lines to fail, enough to characterize the percentiles of the failure-time distribution that are of interest. Simulations and other calculations show that this approach offers the benefits of much reduced test times and better confidence in sample estimates of early percentiles and of sigma. It can also be used to detect and characterize extrinsic failure-time distributions. An experimental approach is proposed that uses special test structures with many parallel-running test lines. This makes possible early reliability assessments at the wafer level with a full-wafer testing system.

Original languageEnglish (US)
Pages1-8
Number of pages8
StatePublished - Dec 1 2000
Event2000 IEEE International Integrated Reliability Workshop - Lake Tahoe, CA, USA
Duration: Oct 23 2000Oct 26 2000

Other

Other2000 IEEE International Integrated Reliability Workshop
CityLake Tahoe, CA, USA
Period10/23/0010/26/00

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering

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