Abstract
Crossed-dipole resonant filters were fabricated using direct-write electron electron-beam lithography (DEBL) and nanoimprint lithography (NIL). NIL studies were based on the physical deformation of the resist, cast on a substrate by a mask with submicron structures on its surface. The imprinting was accomplished in a modified commercial hot press. The results showed that NIL offered fast and cost effective alternative to DEBL in fabrication of IR filters.
Original language | English (US) |
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Pages (from-to) | 3578-3581 |
Number of pages | 4 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 18 |
Issue number | 6 |
DOIs | |
State | Published - Nov 2000 |
Event | 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA Duration: May 30 2000 → Jun 2 2000 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering