Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies

Irina Puscasu, G. Boreman, R. C. Tiberio, D. Spencer, R. R. Krchnavek

Research output: Contribution to journalConference articlepeer-review

20 Scopus citations

Abstract

Crossed-dipole resonant filters were fabricated using direct-write electron electron-beam lithography (DEBL) and nanoimprint lithography (NIL). NIL studies were based on the physical deformation of the resist, cast on a substrate by a mask with submicron structures on its surface. The imprinting was accomplished in a modified commercial hot press. The results showed that NIL offered fast and cost effective alternative to DEBL in fabrication of IR filters.

Original languageEnglish (US)
Pages (from-to)3578-3581
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number6
DOIs
StatePublished - Nov 2000
Event44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA
Duration: May 30 2000Jun 2 2000

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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