Applying HWCVD to particle coatings and modeling the deposition mechanism

Kenneth K.S. Lau, Karen K. Gleason

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


A specific HWCVD variant known as initiated chemical vapor deposition or iCVD has been successfully implemented in the encapsulation of fine particles with polymers. Without using a liquid medium, iCVD enabled the coating of fine particles down to the nanoscale without particle agglomeration. More significantly, iCVD was demonstrated as a versatile surface design methodology in achieving the requisite surface properties by either directly depositing the polymer with the required functionality or through subsequent binding of the functionality on a pre-deposited reactive polymer. The ability to adapt iCVD to an increasingly wider array of substrates and polymer chemistries was aided by understanding iCVD reaction kinetics through mechanistic modeling.

Original languageEnglish (US)
Pages (from-to)674-677
Number of pages4
JournalThin Solid Films
Issue number5
StatePublished - Jan 15 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


Dive into the research topics of 'Applying HWCVD to particle coatings and modeling the deposition mechanism'. Together they form a unique fingerprint.

Cite this